Photocatalytic property of polyester fabrics coated with Ag/TiO2 composite films by magnetron sputtering
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چکیده
منابع مشابه
Deposition of Visible Light Active Photocatalytic Bismuth Molybdate Thin Films by Reactive Magnetron Sputtering
Bismuth molybdate thin films were deposited by reactive magnetron co-sputtering from two metallic targets in an argon/oxygen atmosphere, reportedly for the first time. Energy dispersive X-ray spectroscopy (EDX) analysis showed that the ratio of bismuth to molybdenum in the coatings can be effectively controlled by varying the power applied to each target. Deposited coatings were annealed in air...
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CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
متن کاملThe tribological properties of Cu-Ni3Al-MoS2 composite coating deposited by magnetron sputtering
In industrial applications, most materials are exposed to wear and friction because multiple conditions are used. However, the tribological properties of these materials can be improved with different techniques. One such technique that improves the frictional property of a surface is the use of self-lubricating coatings. In this study, multicomponent coatings of nominal composition Cu-Ni3Al-Mo...
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Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...
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Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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ژورنال
عنوان ژورنال: Vacuum
سال: 2020
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2019.109103